PURPOSE: A heater system for a wafer is provided to prevent ununiform temperature variation caused by a long-term use and stabilize the entire system by changing a wafer heating unit from a halogen lamp type to an electrode heater block type. CONSTITUTION: A chuck for settling the wafer(10) is installed in the electrode heater block. Each line connected to the electrode heater block is connected to an alternating current(AC) power(34) for power supply and a proportional-integral-differential(PID) control(36). Each line connected to the heater block is vacuum-sealed in a window. The material of the electrode heater block is composed of an electrode processed with aluminum or ceramic.