发明名称 METHOD AND DEVICE FOR SEPARATING SEMICONDUCTOR DEVICES
摘要 PROBLEM TO BE SOLVED: To greatly enhance device reliability after packaging by efficiently removing cracks developed in wafers due to back grinding in a method and device for separating a wafer carrying a multiplicity of semiconductor devices into individual semiconductor devices. SOLUTION: The method has an etching process wherein dicing lines 7 in the circuit-carrying surface 2a of a wafer 2 are etched for the formation of half-cut trenches 3, a process wherein a back grind tape 4 is bonded to the surface 2a of the wafer 2 and mechanical grinding is at the same time accomplished for the removal of a prescribed thickness of the backside 2b of the wafer 2 with a thickness 5 retained for preventing the trenches 3 from penetration, and a process wherein etching or grinding, chemical or mechanical, is performed on the side of the backside 2b of the wafer 2 for the separation of the wafer 2 into individual semiconductor devices 12. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003179005(A) 申请公布日期 2003.06.27
申请号 JP20010380491 申请日期 2001.12.13
申请人 TOKYO ELECTRON LTD 发明人 YUASA MITSUHIRO
分类号 H01L21/302;H01L21/301;H01L21/3065;(IPC1-7):H01L21/301;H01L21/306 主分类号 H01L21/302
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