| 摘要 |
PROBLEM TO BE SOLVED: To provide a microscope apparatus which can assure the required accuracy of measurement even when patterns for measurement are highly integrated or miniaturized. SOLUTION: The microscope apparatus has an illumination optical system 10 for irradiating the patterns 5 for measurement with the illumination light from a light source 11 and an imaging optical system 30 having an objective lens 17 for observation of the images of the patterns 5 for measurement, in which the wavelength of the reflected light of the patterns 5 for measurement emitted from the objective lens 17 is detected and the position of an illumination aperture-stop 20 arranged in the optical path of the illumination optical system 10 is adjusted in accordance with the result of the detection. COPYRIGHT: (C)2003,JPO
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