发明名称 |
Production of an ultrapure solution from an industrial quality chemical product by separating the gaseous and liquid phases in a storage vessel and dissolving the gas in deionised water |
摘要 |
<p>The production of an ultrapure solution of a chemical product from an industrial quality chemical gas includes drawing off the gas into a storage vessel and retaining it in both gaseous and liquid phases, avoiding the formation and/or entrainment of liquid droplets of liquid chemical product and transporting the gaseous phase to a tank to dissolve the gas in deionised water to obtain the solution with the requisite concentration of chemical product. Independent claims are also included for: (a) systems for the production of an ultrapure chemical solution from an industrial quality chemical product; (b) production of an ultrapure solution for the in-situ fabrication of such solutions for cleaning silicon wafers for use in the semiconductor industry; and (c) the production systems for the in-situ fabrication of ultra pure solutions for cleaning silicon wafers for the semiconductor industry.</p> |
申请公布号 |
FR2834045(A1) |
申请公布日期 |
2003.06.27 |
申请号 |
FR20010016586 |
申请日期 |
2001.12.20 |
申请人 |
AIR LIQUIDE ELECTRONICS SYSTEMS |
发明人 |
DULPHY HERVE;DUCHATEAU ERIC |
分类号 |
B01F3/04;F17C7/04;(IPC1-7):F17C7/04;B08B3/06;B01F1/00 |
主分类号 |
B01F3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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