发明名称 Production of an ultrapure solution from an industrial quality chemical product by separating the gaseous and liquid phases in a storage vessel and dissolving the gas in deionised water
摘要 <p>The production of an ultrapure solution of a chemical product from an industrial quality chemical gas includes drawing off the gas into a storage vessel and retaining it in both gaseous and liquid phases, avoiding the formation and/or entrainment of liquid droplets of liquid chemical product and transporting the gaseous phase to a tank to dissolve the gas in deionised water to obtain the solution with the requisite concentration of chemical product. Independent claims are also included for: (a) systems for the production of an ultrapure chemical solution from an industrial quality chemical product; (b) production of an ultrapure solution for the in-situ fabrication of such solutions for cleaning silicon wafers for use in the semiconductor industry; and (c) the production systems for the in-situ fabrication of ultra pure solutions for cleaning silicon wafers for the semiconductor industry.</p>
申请公布号 FR2834045(A1) 申请公布日期 2003.06.27
申请号 FR20010016586 申请日期 2001.12.20
申请人 AIR LIQUIDE ELECTRONICS SYSTEMS 发明人 DULPHY HERVE;DUCHATEAU ERIC
分类号 B01F3/04;F17C7/04;(IPC1-7):F17C7/04;B08B3/06;B01F1/00 主分类号 B01F3/04
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