发明名称 PLASMA PROCESSING APPARATUS, MATCHING BOX, IMPEDANCE MATCHING DEVICE, AND COUPLER
摘要 PROBLEM TO BE SOLVED: To enable to mount an electronic circuit under the physically and electrically stable condition. SOLUTION: A matching box is provided with a contactor inserting section which is an inserting port of a contactor. When the matching box is fixed to the external wall of the side surface of a vacuum container, it is positioned under the condition in which the space margin is maintained for a power feeding bar. Thereafter, electrical contact between an external circuit and the power feeding bar is established by inserting the contactor to the contactor inserting section. Moreover, a socket 40 provided at the output section of an impedance matching device is provided with an engagement hole 41 in order to hold the power feeding bar 32 by engaging this bar with the center of a cylindrically formed metal material 40a. At the internal wall of the engagement hole 41, a covering layer 42 consisting of an insulator is provided for electrical insulation from the power feeding bar 32. A high frequency power generated by a second high frequency power supply 51 is transferred to the power feeding bar 32 through inductive coupling. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003178988(A) 申请公布日期 2003.06.27
申请号 JP20010380183 申请日期 2001.12.13
申请人 TOKYO ELECTRON LTD 发明人 HIGASHIURA TSUTOMU
分类号 C23C16/509;H01J37/32;H01L21/205;H03H7/38;(IPC1-7):H01L21/205 主分类号 C23C16/509
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