发明名称 HIGH ELECTRON MOBILITY TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a GaN high electron mobility transistor having a high electron mobility of an electron transit layer. SOLUTION: The high electron mobility transistor comprises the electron transit layer made of a GaN compound semiconductor layer, and an electron supply layer made of a GaN compound semiconductor layer having a larger band gap energy than that of the electron transit layer in such a manner that the electron transit layer contains an In of 1×10<SP>19</SP>to 5×10<SP>20</SP>cm<SP>-3</SP>. Or, the electron transit layer contains an As or P of 1×10<SP>19</SP>to 5×10<SP>20</SP>cm<SP>-3</SP>. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003179082(A) 申请公布日期 2003.06.27
申请号 JP20020323750 申请日期 2002.11.07
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 YOSHIDA KIYOTERU
分类号 H01L29/812;H01L21/338;H01L29/778;(IPC1-7):H01L21/338 主分类号 H01L29/812
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