| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a monolithic ceramic electronic part capable of inhibiting the shortening of a lifetime resulting from the irregularities of an interface between an internal electrode layer and a ceramic layer, and the generation of a structural defect (such as a delamination, the curve of an electrode section or the like) in the case of a thin-film multilayer. SOLUTION: When the monolithic ceramic electronic part having the thickness of 0.2 to 0.7μm of the internal electrode layers and the thickness of 3μm or less of the ceramic layer interposed between the internal electrode layers is manufactured, the roughness (Ra) of the interfaces among the internal electrode layers 8 and 9 and the ceramic layer 2 in the monolithic ceramic electronic part (a monolithic ceramic capacitor) 1 having a structure, in which a plurality of the internal electrode layers 8 and 9 are laminated in a ceramic element 3 through the ceramic layer (a dielectric ceramic layer) 2, is set in 200 nm or less while the generation rate of defects (bores) in the ceramic layer 2 is set in 1% or less at an area ratio in a sectional polished surface obtained by polishing a cut end face. COPYRIGHT: (C)2003,JPO
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