发明名称 UP-TO-DATE ILLUMINATION SYSTEM USEABLE IN MICROLITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To maintain telecentric illumination in a numerical aperture by altering the size of an illumination area without (i.e., increasing irradiation area) the loss of energy upon the size of the illumination area being altered. SOLUTION: The invention relates to an illumination system comprising an illumination light source, a beam conditioner disposed on an optical path together with the illumination light source, a first diffraction array, a condenser system, and a second diffraction array. The illumination light source serves to direct light to the first diffraction array through the beam conditioner. The light is then directed to the condenser system disposed on the optical path extending between the first diffraction array and the second diffraction array. The condenser system includes a plurality of fixed optical components and a plurality of movable optical components. The plurality of the movable optical components are disposed on the optical path together with the plurality of the fixed optical components. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003178970(A) 申请公布日期 2003.06.27
申请号 JP20020305101 申请日期 2002.10.18
申请人 ASML US INC 发明人 OSKOTSKY MARK;RYZHIKOV LEV;COSTON SCOTT;TSACOYEANES JAMES;BAUMGARTNER PETER J;AUGUSTYN WALTER
分类号 G02B19/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B19/00
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