发明名称 BLACK PHOTOSENSITIVE COMPOSITION FOR COLOR FILTER, COLOR FILTER AND METHOD FOR MANUFACTURING COLOR FILTER
摘要 <P>PROBLEM TO BE SOLVED: To meet a demand for a color filter for a liquid crystal display device with high surface smoothness obtained by patterning a black matrix pattern with back exposure in forming the black matrix for the color filter. <P>SOLUTION: A back exposure black matrix for the color filter is provided which is black photosensitive composition for the color filter composed of a binder polymer, a cross-linking monomer, a photopolymerization initiator and a pigment and which is characterized by adding a silane compound having one or more of photo cross-linking functional groups and of reactive groups producing a siloxane bond with dehydration polymerization. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003177228(A) 申请公布日期 2003.06.27
申请号 JP20010375361 申请日期 2001.12.10
申请人 TOPPAN PRINTING CO LTD 发明人 SUDA HIRONOBU
分类号 G03F7/004;C08F292/00;G02B5/20;G02B5/22;G02F1/1335;G03F7/028 主分类号 G03F7/004
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