发明名称 METHOD OF TREATING SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To prevent change in quality and deterioration of the coating liquid in a nozzle by removing the coating liquid attaching to the nozzle. <P>SOLUTION: After the delivery of the coating liquid, residual coating liquid inside the coating-liquid delivery nozzle 60 is sucked toward the supply-source side to retreat the top-end liquid level A of the coating liquid. At this moment, atmospheric gas H is flowed in the coating-liquid delivery nozzle 60. Then, the top-end 60a of the coating-liquid delivery nozzle 60 is immersed in a solvent S in a storage 80, and is cleaned. Under this condition, the coating liquid inside the coating-liquid delivery nozzle 60 is further sucked toward the supply-source side to introduce the solvent S within the top-end 60a, and the inside wall of the top-end 60a is cleaned by the solvent S. Besides, the opening of the coating- liquid delivery nozzle 60 is closed by the solvent S to separate the coating liquid within the coating-liquid delivery nozzle 60 from the atmosphere, preventing drying of the coating liquid. Furthermore, the coating liquid inside the coating-liquid delivery nozzle 60 is closed via the atmospheric gas H to prevent mixing of the solvent S with the coating liquid. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003178965(A) 申请公布日期 2003.06.27
申请号 JP20020278771 申请日期 2002.09.25
申请人 TOKYO ELECTRON LTD 发明人 NISHIJIMA KAZUHIRO;MIZUNO GOSHI
分类号 G03F7/16;B05B15/02;H01L21/027 主分类号 G03F7/16
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