DATA CORRECTING METHOD FOR PHASE SHIFT MASK

摘要

PROBLEM TO BE SOLVED: To provide a method which can improve the degree of production margin in a phase shift mask manufacturing process and takes the actual width and length of a linear pattern into consideration as a correcting method for photomask data for a drawing device for manufacturing a substrate digging type Levenson phase shift photomask.

SOLUTION: A transmissivity function representing the transmissivity of a transmission part with a 180°phase shift when the transmissivity of a transmission part with a 0°phase shift is 100% is previously found corresponding to the target predetermined mask section structure of the substrate digging type Levenson phase shift photomask by using as parameters the size of a shading part prescribed by the width and length and the sizes of apertures of the 0°transmission part and 180°transmission part adjacent to the shading part and the transmission part with the 180°phase shift when the 100% transmissivity of the transmission part with the 0°phase shift is found from the found transmissivity function, layout design to pattern two-dimensional information, or corrected pattern two-dimensional information to perform secondary simulation, thereby adjusting data of the pattern.

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