发明名称 LASER APPARATUS AND LASER RADIATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a laser apparatus for continuous oscillation to enhance the processing efficiency and also to provide a method of manufacturing a semiconductor device using the same laser apparatus. SOLUTION: The laser apparatus comprises a laser oscillating device, a means for rotating an processing object, a means for moving the processing object toward the center of rotation and moreover toward the external side from the center, and an optical system to process the laser beam emitted from the laser oscillating device to radiate the constant area within the moving range of the processing object with the processed laser beam. This laser apparatus is characterized in that the overlapping area of the constant area and the processing object can be moved by moving the processing object, while it is rotated toward the center of rotation or toward the external side from the center. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003178996(A) 申请公布日期 2003.06.27
申请号 JP20020252777 申请日期 2002.08.30
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;TANAKA KOICHIRO;MIYAIRI HIDEKAZU;SHIGA AIKO;SHIMOMURA AKIHISA
分类号 H01L21/20;H01L21/268;H01S3/00;(IPC1-7):H01L21/268 主分类号 H01L21/20
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