| 摘要 |
PROBLEM TO BE SOLVED: To provide a ligand-supplying apparatus and a ligand-supplying method for accurately and quantitatively supplying ligand onto a metal thin film. SOLUTION: The ligand-supplying apparatus comprises a supply means for supplying ligand onto the metal film, a control means for controlling the amount of ligand to be supplied by the supply means, and a light detection means for detecting the reflection light intensity of laser beams that are applied to the metal thin film. The control means stores and retains characteristics for indicating the relationship between the resonance angle of surface plasmon resonance that is generated in the metal thin film and the mass of the ligand, and controls the amount of supply of the ligand by detecting the intensity of reflection light when the laser beams are applied to the metal thin film at a resonance angle obtained from the characteristics corresponding to the target amount of coating of the ligand. COPYRIGHT: (C)2003,JPO
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