| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To correct the fine black defects or white defects on a photomask with high throughput and high accuracy by using a scanning probe microscope. <P>SOLUTION: Continuous imaging of a pattern 5 for drift correction is performed by using an in-depth probe 2 which can be driven independently in parallel from an in-depth probe 1 for processing as an atomic force microscope in-depth probe in a contactless mode while only the black or white defect region 6 discriminated from a glass substrate 3 or normal pattern 4 is corrected by selectively scanning only this region with≥1 piece of the in-depth probe 1 using a scanning probe microscope capable of independently driving≥2 pieces of the in-depth probes. The amount of a drift is calculated from the comparison with the image of the previous time and a feedback is suitably applied to the scanning range of the in-depth probe 1 for processing, by which the drift is corrected. <P>COPYRIGHT: (C)2003,JPO</p> |
