| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem of the prior art that when a particle source of a charged particle ray light exposure apparatus (e.g. electron emission source) has a relatively large area, and uniform emission characteristics over the entire surface of the particle source are required, particle distribution becomes nonuniform owing to a magnetic field from another electron optics member disposed in the vicinity of the particle source, and charged particles are prevented from correctly forming a crossover image by receiving undesirable momentum, and are hereby prevented from forming a uniform image on a wafer. SOLUTION: There is provided means, with which a magnetic field by a condenser lens disposed in the vicinity of a particle source is prevented from influencing a charged particle source. To achieve this, there is disposed a backing lens with which the condenser lens and the particle source are separated in the distance therebetween, and with which the magnetic field from the condenser lens is cancelled in the particle source. COPYRIGHT: (C)2003,JPO
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