APPARATUS AND METHOD FOR FABRICATING PHOTONIC CRYSTAL

摘要

PURPOSE: An apparatus and a method for fabricating photonic crystal are provided to form a grating pattern of two-dimensional photonic crystal by using the interferometric lithography. CONSTITUTION: A photonic crystal fabrication apparatus includes a laser beam source(10), a shutter(20), a beam expander(30), a lens(40), and a rotary stage(50). The laser beam source generates beams of wavelength of λ. The shutter is used for controlling the length of exposure of the beams. The lens is used for converting the output beams of the beam expander to parallel beams. The rotary stage is used for forming a grating pattern by changing a shape of grating and a period of a line pattern. The rotary stage includes a wafer holder(52) for changing the shape of the grating and a reflector(51) for changing the period of the line pattern.