| 摘要 |
PROBLEM TO BE SOLVED: To provide a calibration method for a charged-particle-beam exposure system capable of reducing time needed to calibrate the optics system. SOLUTION: In conducting calibration of the beam, the deflection center of the electron optics system is positioned at the center of the group of sub- fields 66-1 to 66-20, the sub-fields 66-1 to 66-20 are sequentially scanned by the beam, and the beam property is measured at each position. Then, the deflection center of the electron optics system is positioned at the center of the group of the sub-fields 66-21 to 66-40, by moving the reticle stage and the wafer stage. By keeping this positional relation, the sub-fields 66-21 to 66-40 are sequentially scanned by the beam, and the beam property is measured at each position. Based on the above measurements, calibration factors on the optics system for each sub-field 66 are set, and the calibrations on the electron optics system (for example, deflection position error, image magnification, image rotation, etc.), are conducted. COPYRIGHT: (C)2003,JPO
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