发明名称 EXTRACTION ELECTRODE SYSTEM OF ION IMPLANTER AND ION IMPLANTER
摘要 PROBLEM TO BE SOLVED: To provide an extraction electrode system of an ion implanter and the ion implanter capable of efficiently extracting ion beam even if accelerating voltage is low and capable of extracting ion beam in a predetermined direction. SOLUTION: The extraction electrode system having two or more sets of extraction electrodes for generating ion beam IB by extracting ion generated by an ion source 5 is arranged in a chamber for ion beam generation of the ion implanter. In the extraction electrode system 7, the extraction electrode has an electrode main body and an attachment plate and the relative permeability of at least the attachment plate 13 of the extraction electrode 8 positioned nearest to the ion source is smaller than the relative permeability of at least an attachment plate 15 of a set of other extraction electrodes 9. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003178688(A) 申请公布日期 2003.06.27
申请号 JP20010379249 申请日期 2001.12.12
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 YOKOGAWA ISAO
分类号 C23C14/48;H01J27/02;H01J37/08;H01J37/317;H01L21/265;(IPC1-7):H01J27/02 主分类号 C23C14/48
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