| 摘要 |
PURPOSE: Provided are cyclic sulfonium and sulfoxonium photoacid generators and a photoresist comprising the same, which are useful as photoactive components of photoresists imaged at short wavelengths such as 248 nm, 193 nm and 157 nm. CONSTITUTION: The photoacid generator compounds are represented by the formula 1, wherein R is a non-hydrogen substituent or a linkage to another photoacid generator moiety; each of Y and Z is independently hydrogen or a non-hydrogen substituent; or two of Y and/or Z are taken together to form a fused ring; n is an integer of 3-8; and X is a counter anion, except that both Y and Z are C1-C4 alkyl on the same ring carbon.
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