发明名称 PATTERN EVALUATION DEVICE, PATTERN EVALUATION METHOD AND PROGRAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method, device and program for accurately and swiftly evaluating a pattern. <P>SOLUTION: A pattern contour model MT composed of picture element rows with specified contour point positions EP and respectively stored with a relative gray-level value is generated by using the pattern evaluation device 2 provided with an image processing device 20. Image data of an evaluation pattern is acquired, an image matching process is executed on a measurement object image by using the pattern contour model MT as a reference image, and coordinates of contour points of the evaluation pattern are detected. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003178314(A) 申请公布日期 2003.06.27
申请号 JP20020281692 申请日期 2002.09.26
申请人 TOSHIBA CORP 发明人 MITSUI TADASHI
分类号 G01B11/24;G01N21/956;G06T1/00;G06T7/00;G06T7/60 主分类号 G01B11/24
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