发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR IMAGE FORMATION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for image formation having improved anti-tackiness of a preliminarily dried film, capable of improving electrical properties by a lowered dielectric constant and suitable for a solder resist, an etching resist and an electroless plating resist for production of a printed wiring board, an insulating layer of a build-up process printed wiring board, a black matrix, a color filter, photo-spacers, electrodes, barrier ribs and a phosphor for production of a liquid crystal display panel, a printing plate, etc. <P>SOLUTION: The photosensitive resin composition comprises a curable resin having two or more radical-polymerizable unsaturated bonds and one or more hydroxyl groups and/or carboxyl groups per molecule, a compound having two or more vinyl ether groups and/or vinyl thio-ether groups per molecule and a photopolymerization initiator. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003177534(A) 申请公布日期 2003.06.27
申请号 JP20010378436 申请日期 2001.12.12
申请人 NIPPON SHOKUBAI CO LTD 发明人 OTSUKI NOBUAKI;FUKADA AKIHIKO
分类号 G03F7/038;G03F7/004;G03F7/027;H05K3/06;H05K3/18;H05K3/28;H05K3/46 主分类号 G03F7/038
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