发明名称 |
SEMICONDUCTOR CRYSTAL AND METHOD FOR MANUFACTURING IT |
摘要 |
PROBLEM TO BE SOLVED: To provide an effective structure and a method for manufacturing it in manufacturing a crystal having a lattice constant different from that of that of Si on an Si substrate. SOLUTION: A buffer layer comprising a IV group element is formed on a porous Si, on which a crystal layer having a lattice constant different from that of an Si single crystal is deposited. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003178977(A) |
申请公布日期 |
2003.06.27 |
申请号 |
JP20010378317 |
申请日期 |
2001.12.12 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
KANZAWA YOSHIHIKO;TAKAGI TAKESHI;ASAI AKIRA;ONISHI TERUTO |
分类号 |
H01L21/205;H01L21/20;H01L29/78;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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