发明名称 SEMICONDUCTOR CRYSTAL AND METHOD FOR MANUFACTURING IT
摘要 PROBLEM TO BE SOLVED: To provide an effective structure and a method for manufacturing it in manufacturing a crystal having a lattice constant different from that of that of Si on an Si substrate. SOLUTION: A buffer layer comprising a IV group element is formed on a porous Si, on which a crystal layer having a lattice constant different from that of an Si single crystal is deposited. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003178977(A) 申请公布日期 2003.06.27
申请号 JP20010378317 申请日期 2001.12.12
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KANZAWA YOSHIHIKO;TAKAGI TAKESHI;ASAI AKIRA;ONISHI TERUTO
分类号 H01L21/205;H01L21/20;H01L29/78;(IPC1-7):H01L21/20 主分类号 H01L21/205
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