| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing thin film magnetic element by which a multilayered film formed by laminating soft magnetic films formed by the sputtering method upon another can be patterned with accuracy even when the thickness of the multilayered film increases, and can prevent the occurrence of eddy current losses or leakage magnetic fluxes caused by lowered patterning accuracy. SOLUTION: The method of manufacturing the thin film magnetic element having the multilayered film formed by laminating soft magnetic films formed by the sputtering method upon another includes a step of forming a resist pattern 12 on a substrate 10, a step of giving roundness 12i to the corners of the pattern 12 by post-baking the pattern 12, and a step of forming plated layers 13 for lift-off on the corners of the pattern 12 having the roundness 12i. The method also includes at least a step of removing the pattern 12, a step of forming the multilayered film by successively laminating the soft magnetic films on the portion of the substrate 10 from which the pattern 12 is removed by the sputtering method, and a step of removing the plated layers 13. COPYRIGHT: (C)2003,JPO
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