| 摘要 |
PURPOSE: An optical magnification adjustment system and a projection exposure device are provided to adjust the magnification for projecting an image according to the expansion or contraction of a printed circuit board. CONSTITUTION: The optical magnification adjustment system comprising: a first plano-convex or plano-concave lens with an optical power &phgr;2, and a second concave-plano or convex-plano lens with an optical power &phgr;3, both of which are installed in a telecentric position on the side of an object surface or on the side of an image in an optical exposure system, wherein the total system magnification of the optical exposure system may be minutely varied by changing the space between the lenses, where, Φ : Total optical power of the optical magnification adjustment system, S1: distance from the first surface of the first lens to the object surface (i.e., photo mask surface), d0: Center space of the two lenses, that satisfies a magnification beta=1, e1=t1/n1 (t1: center thickness of the first lens 1, n1: refraction index of the first lens 1).
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