| 摘要 |
<p>An abrasive article (12) is described. The article (12) is suitable for the deposition and mechanical polishing of a conductive material, and comprises: a polishing layer having a textured surface (102) comprising a binder and a second surface opposite the textured surface (102), the polishing layer further comprising a first channel (104) extending therethrough; a backing (118) having a first backing surface and a second backing surface, the first backing surface associated with the second surface of the polishing layer, the backing (118) comprising a second channel (140, 148) coextensive with the first channel (104) and extending through the backing from the first backing surface to the second backing surface; the first channel (104) and the second channel (140, 148) dimensioned with respect to one another so that the textured surface (102) of the polishing layer is outside of a line of sight (a).</p> |
