发明名称 |
Method for fabricating semiconductor layers |
摘要 |
A method is provided for fabricating a useful layer containing at least one semiconductor layer, in which the useful layer is separated from a carrier. In this case, the useful layer is applied to the carrier and an auxiliary carrier is applied to that side of the useful layer that is remote from the carrier by a connecting layer at a joining temperature. Afterward, the carrier is stripped away at a temperature that is greater than or equal to the joining temperature and is less than the melting point of the connecting layer. At least a part of the useful layer together with the auxiliary carrier is removed from the carrier.
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申请公布号 |
US2003119217(A1) |
申请公布日期 |
2003.06.26 |
申请号 |
US20020324428 |
申请日期 |
2002.12.20 |
申请人 |
PLOSSL ANDREAS;HAHN BERTHOLD;EISERT DOMINIK;KAISER STEPHAN |
发明人 |
PLOSSL ANDREAS;HAHN BERTHOLD;EISERT DOMINIK;KAISER STEPHAN |
分类号 |
H01L33/00;H01L21/02;H01L21/20;(IPC1-7):H01L21/00 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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