发明名称 Method and installation for densifying porous substrates by chemical vapour infiltration
摘要 An installation for densification of porous substrates by CVI comprises an oven, a zone for loading substrates in the oven, means for heating substrates loaded in the loading zone, at least one inlet for admitting reactive gas in the oven, and at least one gas heating zone situated in the oven between the reactive gas inlet and the loading zone. At least one gas preheating device is located outside the oven and is connected to the gas inlet so as to preheat the reactive gas before it enters the oven.
申请公布号 US2003118728(A1) 申请公布日期 2003.06.26
申请号 US20010034848 申请日期 2001.12.26
申请人 SION ERIC;BAUDRY YVON;DELPERIER BERNARD 发明人 SION ERIC;BAUDRY YVON;DELPERIER BERNARD
分类号 C04B35/80;C04B35/83;C23C16/04;C23C16/26;C23C16/42;C23C16/44;C23C16/455;(IPC1-7):C23C16/00 主分类号 C04B35/80
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