发明名称 |
Method and installation for densifying porous substrates by chemical vapour infiltration |
摘要 |
An installation for densification of porous substrates by CVI comprises an oven, a zone for loading substrates in the oven, means for heating substrates loaded in the loading zone, at least one inlet for admitting reactive gas in the oven, and at least one gas heating zone situated in the oven between the reactive gas inlet and the loading zone. At least one gas preheating device is located outside the oven and is connected to the gas inlet so as to preheat the reactive gas before it enters the oven.
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申请公布号 |
US2003118728(A1) |
申请公布日期 |
2003.06.26 |
申请号 |
US20010034848 |
申请日期 |
2001.12.26 |
申请人 |
SION ERIC;BAUDRY YVON;DELPERIER BERNARD |
发明人 |
SION ERIC;BAUDRY YVON;DELPERIER BERNARD |
分类号 |
C04B35/80;C04B35/83;C23C16/04;C23C16/26;C23C16/42;C23C16/44;C23C16/455;(IPC1-7):C23C16/00 |
主分类号 |
C04B35/80 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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