发明名称 Planarization of ceramic substrates using porous materials
摘要 This invention provides a concept of using porous materials on ceramic substrate planarization. This planarized substrate comprises a ceramic substrate, a buffer layer, and a nanostructure layer. The ceramic substrate can enhance the structural strength and surface-mount capability. The buffer layer provides the adhesion between a substrate and a nanostructure layer. Nanostructure layer provides the required surface smoothness of the ceramic substrates for performing thin-film processing techniques and enhancing adhesion for metallization and electronic materials. This layer also provides required properties for integrating electronic such as thermal conductivity, electrical insulation, dielectric, etc.
申请公布号 US2003118738(A1) 申请公布日期 2003.06.26
申请号 US20010023878 申请日期 2001.12.21
申请人 SHUY GEOFFREY WEN-TAI;LU JONG-HONG;LIAO SHENG-JU;CHANG HUAI-LUH;HONG SONG-WEIN;HUANG RUEY-CHENG 发明人 SHUY GEOFFREY WEN-TAI;LU JONG-HONG;LIAO SHENG-JU;CHANG HUAI-LUH;HONG SONG-WEIN;HUANG RUEY-CHENG
分类号 C04B41/52;C04B41/89;H01L21/48;H05K1/03;H05K3/38;(IPC1-7):B05D5/12;B05D1/36 主分类号 C04B41/52
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