发明名称 MULTI-LAYERES WITH VIAS IN FILLED HOLES
摘要 <p>Multi-layers having at least one plated and filled via or through hole (20) in which a portion of the material (22) filling the via or through hole (20) is removed to allow the spaced previously occupied by the removed material to be used for some other purpose. In some multi-layers, the removed material will be replaced by a second plated via or through hole thus providing additional interconnect options or to functioning as a part of a larger component.</p>
申请公布号 WO2003051626(A1) 申请公布日期 2003.06.26
申请号 US2002039893 申请日期 2002.12.13
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