发明名称 |
Semiconductor device and method of checking semiconductor storage device |
摘要 |
It is an object to obtain a semiconductor device having a circuit for CBCM (Charge Based Capacitance Measurement) which can measure a capacitance value with high precision. An MOS transistor constituting a circuit for CBCM has the following structure. More specifically, source-drain regions (4) and (4') are selectively formed in a surface of a body region (16), and extension regions (5) and (5') are extended from tip portions of the source-drain regions (4) and (4') opposed to each other, respectively. A gate insulating film 7 is formed between the source-drain regions (4) and (4') including the extension regions (5) and (5') and a gate electrode (8) is formed on the gate insulating film (7). A region corresponding to a pocket region 6 (6') in a conventional structure having a higher impurity concentration than that of a channel region is not formed in a tip portion of the extension region 5 (5') and a peripheral portion of the extension region (5).
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申请公布号 |
US2003117151(A1) |
申请公布日期 |
2003.06.26 |
申请号 |
US20020232689 |
申请日期 |
2002.09.03 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
KUNIKIYO TATSUYA;EIKYU KATSUMI;YAMASHITA KYOJI;OHTANI KATSUHIRO;UMIMOTO HIROYUKI;KOBAYASHI MUTSUMI |
分类号 |
H01L21/76;H01L21/822;H01L21/8238;H01L21/8242;H01L27/04;H01L27/08;H01L27/092;H01L27/10;H01L27/108;H01L29/10;H01L29/78;(IPC1-7):G01R27/26 |
主分类号 |
H01L21/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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