| 摘要 |
PURPOSE: A copper alloy having low resistivity as well as high chemical resistance for stripper is provided, that is, a copper wiring having high reliability even for photolithography process using an existing stripper is provided. CONSTITUTION: The copper alloy for metal wiring is consisted of Cu-In in which a certain amount of indium (In) is included in a pure copper (Cu) metal as a material forming a metal wiring for LCD (liquid crystal display), wherein 0.1 to 2.0 wt.% of indium is contained in the copper alloy, and wherein the copper alloy has 3 to 4 μΩ·cm at 300 deg.C. The array substrate for LCD comprises gate and data wirings alternately formed on a substrate; a switching device formed at a point where the gate and data wirings cross each other; and pixel electrode connected to the switching device, wherein a material forming at least any one wiring selected from the gate and data wirings and wiring for switching device is a copper alloy in which a certain amount of indium (In) is contained in pure copper (Cu) metal.
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