发明名称 |
Release material, release material article, and process for producing the release material article |
摘要 |
The present invention provides a release material formed by irradiating a release material precursor having a shear storage modulus of about 1x102 to about 3x106 Pa at 20° C. and a frequency of 1 Hz, wherein the release material has a contact angle of 15° or more, measured using a mixed solution of methanol and water (volume ratio: 90/10) having a wet tension of 25.4 mN/m. The release material of the present invention has improved anchoring to certain substrates, ensuring relatively low release strength from certain pressure-sensitive adhesives, particularly even after the exposure to a high temperature. Thus, the release materials are capable of allowing the pressure-sensitive adhesive to maintain stable residual adhesion strength.
|
申请公布号 |
US2003118770(A1) |
申请公布日期 |
2003.06.26 |
申请号 |
US20020203826 |
申请日期 |
2002.08.13 |
申请人 |
SUWA TOSHIHIRO;SHINOHARA MASARU;YASUI YUTAKA;TOMA TETSUYA |
发明人 |
SUWA TOSHIHIRO;SHINOHARA MASARU;YASUI YUTAKA;TOMA TETSUYA |
分类号 |
C09J7/02;(IPC1-7):B32B33/00 |
主分类号 |
C09J7/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|