Quartz glass blank used for an optical component for transferring ultraviolet radiation in microlithography e.g. for the production of highly integrated circuits has a glass structure without oxygen defect sites

摘要

Quartz glass blank has a glass structure without oxygen defect sites, a hydrogen content of 3 x 10<17> to 2.0 x 10<18> molecules/cm<3>, a hydroxyl content of 500-1000 wt. ppm, a silicon hydrogen group content of less than 2 x 10<17> molecules/cm<3>, a chlorine content of 60-120 wt. ppm, an inhomogenity in refractive index DELTA n of less than 2 ppm and voltage birefringence of less than 2 nm/cm. Preferred Features: The hydroxyl (OH) content is 600-900, preferably 750-950 wt. ppm. The hydrogen content is 5 x 10<17> to 1.0 x 10<18> molecules/cm<3>. The chlorine content is 80-100 wt. ppm.