| 摘要 |
An optical member used in a practical wavelength region in an infrared region has a substrate (11), and an optical thin film consisting of a plurality of layers film-formed on the substrate (11). A film forming device comprises an optical monitor (4) for measuring spectral characteristics in a specified wavelength region in a visible region, an optical monitor (5) for measuring the spectral characteristics in a specified wavelength region in an infrared region, and a practical wavelength region optical monitor for measuring the spectral characteristics in the above practical wavelength region. The film thickness of each film-formed layer is determined based on spectral characteristics measured by either of the monitors (4, 5), and the film thickness setting value of a non-film-formed layer is adjusted based on the film thickness. Spectral characteristics measured by the practical wavelength region optical monitor during and after the film-forming of an optical thin film are reflected in the film-forming of the next optical thin film on the next substrate (11).
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