POLYMER POLISHING PAD CONTAINING POLISHING PARTICLE

摘要

PURPOSE: A polymer polishing pad containing a polishing particle is provided to reduce the use of polishing slurry and not to use the polishing slurry by containing the polishing particle inside. CONSTITUTION: A polymer polishing pad is composed of polymer agglomeraters(30), and polymeric matrix(22) throughout which the polymer agglomerater is uniformly dispersed. The polymer agglomerater is composed of polymeric microelements(24), polishing particles(26), and water-soluble polymer(28) coupling the polymeric microelement with the polishing particle.