SEMICONDUCTOR MANUFACTURING APPARATUS USING PLASMA

摘要

PURPOSE: A semiconductor manufacturing apparatus using plasma is provided to be capable of preventing the contamination of the edge portion of a semiconductor substrate due to large plasma particles by supplying anti-plasma gas to the lateral portion of a substrate pedestal using an anti-plasma gas supply part. CONSTITUTION: A semiconductor substrate(100) is processed by using plasma in a reaction chamber. A substrate pedestal(11) is installed in the reaction chamber for loading the semiconductor substrate(100). A gas jetting part is used for jetting and supplying reaction gas onto the semiconductor substrate(100) in the reaction chamber. An anti-plasma gas supply part(60) is installed on the substrate pedestal(11) for supplying anti-plasma gas to the lateral portion of the substrate pedestal. A gas supply part(20) is installed outside the reaction chamber for supplying reaction gas and anti-plasma gas to the reaction chamber and the anti-plasma gas supply part(60), respectively.