| 摘要 |
PURPOSE: A metal target for a PVD(Physical Vapor Deposition) process is provided to be capable of restraining the generation of particles at a flange part of a metal target by forming a scratch type bead part at the flange part. CONSTITUTION: A metal target(10) is provided with a metal target part(101) formed on a disc shaped plate, a flange part(103) prolonged from the metal target part toward the outside, and a bead part(105) formed on the surface of the flange part. Preferably, the metal target part is more protruded than the flange part from the surface of the disc shaped plate. Preferably, the metal target part is made of aluminum alloy. Preferably, the flange part is made of the same material as the metal target part. Preferably, net type scratch formed on the surface of the flange part, is used as the bead part.
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