| 摘要 |
PURPOSE: A plasma deposition apparatus is provided to prevent a film formed on the edge of a target or backing plate from dropping on a substrate. CONSTITUTION: A plasma deposition apparatus includes a dark space shield(31) serving as an anode, a target(32) that is the source of a film to be deposited, and a backing plate(37) for supporting and fixing the target. The edges of the target and backing plate have uneven surfaces. The apparatus further includes a susceptor(34) on which an LCD substrate(33) is placed facing the target, a shield frame(35) located on both sides of the susceptor in order to prevent a metal from being deposited on the edge of the LCD substrate, and a shield frame support(36) for supporting the shield frame.
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