| 摘要 |
A negative-working radiation sensitive resin composition with good heat resistance and low water absorption, which is useful for formation of a resist pattern in the lift-off method or as an insulating member in a organic EL panel and is able to form a reverse tapered resist pattern with a good shape. The negative-working radiation sensitive resin composition comprises (A) an alkali-soluble resin obtained by polycondensation of methylol bisphenol compounds represented by general formula (I) below, phenol compounds used as necessary and aldehydes, (B) a crosslinking agent and (C) a photo-acid generator. The negative-working radiation sensitive resin composition is applied onto a substrate, exposed to light and developed to form a reverse tapered pattern. A metal pattern is formed by vapor-depositing a metal film over the reverse tapered pattern and then removing the resist pattern by developer. <CHEM> Wherein R1 to R4 each represent a hydrogen atom, a C1 to C3 alkyl group or -CH2OH whereupon at least one of R1 to R4 represents -CH2OH, and R5 and R6 each represent a hydrogen atom or a C1 to C3 alkyl group. |
