SEMICONDUCTOR WAFER GUIDE AND SEMICONDUCTOR WET CLEANING APPARATUS HAVING THE SAME

摘要

PURPOSE: A semiconductor wafer guide and a semiconductor wet cleaning apparatus having the same are provided to be capable of preventing a thin film from remaining on a wafer by roundly or obliquely forming the inner portion of a center fixing groove of the wafer guide. CONSTITUTION: A semiconductor wafer guide(4) is provided with a pair of side support parts(30a,30b) having side fixing grooves(31a,31b) spaced apart from each other, a center support part(32) having center fixing grooves(33) located between the side support parts, and a pair of fixing panel(34a,34b) located at both sides of the side and center support parts. Preferably, the inner portion of the center fixing groove is roundly and obliquely formed for minimizing the contact between the center fixing groove and a wafer.