CLEANING APPARATUS OF SEMICONDUCTOR EQUIPMENT

摘要

PURPOSE: A cleaning apparatus of semiconductor equipment is provided to improve working conditions by eliminating fume generated during a wet cleaning process in equipment for performing a metal deposition process and a metal etching process. CONSTITUTION: A turbo fan increases exhaustion absorption, connected to at least one sub duct(101) connected to an acid exhaust main utility(100) as a main acid exhaust path of a semiconductor line. A hood part(210) collects the fume diffused to the air. A flexible hose whose length is controllable connects the turbo fan with the hood part.