发明名称 |
METHOD FOR DETECTING DEFECT |
摘要 |
PURPOSE: A method is provided to be capable of accurately detecting the defect of each portion of analysis object material by designating a defect critical curve as the reference of defect determination according to the distribution of measured signals corresponding to reference signals. CONSTITUTION: Reference signals and measured signals according to the reference signals of patterns formed in analysis object material, are continuously obtained by using gray level(S10). The continuously obtained reference and measured signals are displayed on an X-Y plane(S12). A signal concentrated region is designated on the X-Y plane(S14). A defect critical curve is designated near to the signal concentrated region(S16). The defect of each portion of the analysis object material is detected by using the defect critical curve as a reference(S18).
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申请公布号 |
KR20030049312(A) |
申请公布日期 |
2003.06.25 |
申请号 |
KR20010079495 |
申请日期 |
2001.12.14 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUN, CHUNG SAM;KIM, BAK SONG |
分类号 |
H01L21/66;(IPC1-7):H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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