Method for reducing residual electric charge created by a previous process step on a conductive structure

摘要

Method for reducing a residual electric charge created by a previous process step, particularly a plasma treatment, on a conductive structure, particularly in a semiconductor integrated circuit, is characterised in that the conductive structure is submitted to a plasma treatment having a discharging effect. This discharging treatment can be performed as a stand alone step with selected gas composition of the plasma and/or other parameters adapted like applied power and process pressure, or may be done at the end of the former plasma treatment by altering the gas composition of the plasma and/or other parameters like applied power and process pressure. <IMAGE>