| 摘要 |
PURPOSE: Provided are a cleaning solution composition which is used for preventing the breakage of photoresist pattern, a method for forming a photoresist pattern by using the same, and a semiconductor device obtained by the method. CONSTITUTION: The composition comprises a compound of formula 1, an alcohol compound, and water. In the formula 1, each of R and R1 is hydrogen, C1-C10 alkyl, aryl, azine, aminoalkyl, aminoaryl, carboxylic acid group, or sulfonic acid group, R' is amino group, hydroxyl group, C1-C10 alkyl, aryl, azine, aminoalkyl, aminoaryl, carboxylic acid group, or sulfonic group, A is C1-C5 alkylene or C3-C10 aromatic ring, and n is an integer of 0-2. The ratio of the compound of formula 1: alcohol compound: water is 0.001-5:0.01-10:85-99.989(wt%). |
