| 摘要 |
PURPOSE: A method is provided to be capable of improving a mask life by preventing a variation due to a thermal variation of a deposition mask when fabricating a plurality of devices on a large-scale substrate. CONSTITUTION: A metal seed layer is formed on a glass substrate(4-1), and a photosensitive resin pattern(4-4) corresponding to a mask part of each device is formed on the metal seed layer by a photolithography process. The mask of each device is grown by performing an electroplating process in a resultant resin pattern(4-5) and simultaneously the photosensitive resin pattern is removed by a solvent(4-6). A frame is formed by etching a lower glass substrate of a pattern part so that an outer part of the mask of each device is fixed. An opening part of each device is formed after removing an exposed metal seed layer(4-8,4-8*). The metal seed layer consists of a two-layer structure which is made of chromium(4-2) and copper(4-3).
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