发明名称 PHOTOPOLYMERIZABLE UNSATURATED RESIN, METHOD FOR PRODUCING THE SAME AND ALKALI-SOLUBLE RADIATION- SENSITIVE RESIN COMPOSITION PRODUCED BY USING THE RESIN
摘要 <P>PROBLEM TO BE SOLVED: To provide an alkali-soluble radiation-sensitive resin and a composition containing the same. <P>SOLUTION: The photopolymerizable unsaturated resin is expressed by general formula (1) (X is a bifunctional aromatic epoxy acrylic acid derivative; (n) is an integer of 1-20; Y is a residue obtained by removing an acid anhydride group from a dicarboxylic acid anhydride; and Z is a residue obtained by removing acid anhydride groups from a tetracarboxylic acid dianhydride), has a number-average molecular weight of &ge;1,000 and is produced by reacting the dicarboxylic acid anhydride and the tetracarboxylic acid dianhydride at a molar ratio of 1:99 to 65:35. The invention further provides an alkali-soluble radiation- sensitive resin composition containing the resin. The coating film produced from the composition has excellent properties such as heat-resistance, transparency, exposure-developing property and chemical resistance. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003176344(A) 申请公布日期 2003.06.24
申请号 JP20010377511 申请日期 2001.12.11
申请人 NAGASE CHEMTEX CORP 发明人 FUJII SATORU;YANAGIHARA YOSHIHISA;KITANO KEI
分类号 G03F7/004;C08F290/06;C08G59/42;C08G63/676;G03F7/027 主分类号 G03F7/004
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