发明名称 Defect examination apparatus
摘要 A defect examination apparatus detects defect locations for a plurality of to-be-inspected objects vertically and horizontally arranged according to a prescribed rule. A blob analysis section finds location coordinates for the plurality of to-be-inspected objects. Based on location coordinates found by this blob analysis section, a rotation angle calculation section finds a rotation angle for a horizontal series of the to-be-inspected objects against a horizontal line. The rotation angle calculation section also finds a rotation angle for a vertical series of the to-be-inspected objects against a vertical line. A pitch size calculation section finds vertical and horizontal pitch sizes for the plurality of to-be-inspected objects. A matrix number analysis section finds a matrix number for each to-be-inspected object based on a rotation angle found by the rotation angle calculation section and a pitch size found by the pitch size calculation section.
申请公布号 US6584420(B1) 申请公布日期 2003.06.24
申请号 US20000722994 申请日期 2000.11.27
申请人 OLYMPUS OPTICAL CO., LTD. 发明人 MINAMI TAKESHI
分类号 G01B11/00;G01B11/26;G01B15/00;G01N21/956;G06K9/32;G06T1/00;G06T7/00;G06T7/60;H01L23/12;(IPC1-7):G06K9/00 主分类号 G01B11/00
代理机构 代理人
主权项
地址