发明名称 |
Defect examination apparatus |
摘要 |
A defect examination apparatus detects defect locations for a plurality of to-be-inspected objects vertically and horizontally arranged according to a prescribed rule. A blob analysis section finds location coordinates for the plurality of to-be-inspected objects. Based on location coordinates found by this blob analysis section, a rotation angle calculation section finds a rotation angle for a horizontal series of the to-be-inspected objects against a horizontal line. The rotation angle calculation section also finds a rotation angle for a vertical series of the to-be-inspected objects against a vertical line. A pitch size calculation section finds vertical and horizontal pitch sizes for the plurality of to-be-inspected objects. A matrix number analysis section finds a matrix number for each to-be-inspected object based on a rotation angle found by the rotation angle calculation section and a pitch size found by the pitch size calculation section.
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申请公布号 |
US6584420(B1) |
申请公布日期 |
2003.06.24 |
申请号 |
US20000722994 |
申请日期 |
2000.11.27 |
申请人 |
OLYMPUS OPTICAL CO., LTD. |
发明人 |
MINAMI TAKESHI |
分类号 |
G01B11/00;G01B11/26;G01B15/00;G01N21/956;G06K9/32;G06T1/00;G06T7/00;G06T7/60;H01L23/12;(IPC1-7):G06K9/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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