发明名称 Method and apparatus for improved ion bunching in an ion implantation system
摘要 An ion buncher stage for a linear accelerator system is disclosed for bunching ions in an ion implantation system. The ion buncher stage may be employed upstream of one or more accelerating stages such that the loss of ions in the linear accelerator system is reduced. The invention further includes an asymmetrical double gap buncher stage, as well as a slit buncher stage for further improvement of ion implantation efficiency. Also disclosed are methods for accelerating ions in an ion implanter linear accelerator.
申请公布号 US6583429(B2) 申请公布日期 2003.06.24
申请号 US20020224778 申请日期 2002.08.21
申请人 AXCELIS TECHNOLOGIES, INC. 发明人 SAADATMAND KOUROSH;DIVERGILIO WILLIAM F.
分类号 G21K1/08;G21K5/04;H01J37/317;H05H7/18;(IPC1-7):B01D59/44;H01J49/00 主分类号 G21K1/08
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