| 发明名称 |
Chamber cleaning with fluorides of iodine |
| 摘要 |
A method of cleaning a semiconductor processing chamber uses as a cleaning gas precursor an iodine fluoride such as IF5 and IF7. Reactive species are generated from the precursor with help of plasma. These reactive species are further used to clean the processing chamber.
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| 申请公布号 |
US6581612(B1) |
申请公布日期 |
2003.06.24 |
| 申请号 |
US20010836944 |
申请日期 |
2001.04.17 |
| 申请人 |
APPLIED MATERIALS INC. |
发明人 |
LOEWENHARDT PETER;SHAMOUILIAN SHAMOUIL;IONOV PAVEL;KRISHNARAJ PAMANABHAN |
| 分类号 |
C23C16/44;(IPC1-7):B08B7/00 |
主分类号 |
C23C16/44 |
| 代理机构 |
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