发明名称 SYNTHETIC QUARTZ GLASS INGOT AND SYNTHETIC QUARTZ GLASS AND METHOD FOR MANUFACTURING THEM
摘要 PROBLEM TO BE SOLVED: To provide a synthetic quartz glass ingot as a material of a highly homogeneous synthetic quartz glass member for for an excimer laser, particularly an ArF excimer laser, as an optical member with resistance against laser light, as an optical member used together with a light source such as an excimer laser, and as an optical fiber for UV rays. SOLUTION: The synthetic quartz glass ingot is manufactured by gas phase hydrolysis or oxidation decomposition from the silica source compound by oxyhydrogen flames. The striae observed in the direction perpendicular to the growing direction of the depositing and fusing planes of silica fine particles are periodically distributed along the growing direction of the silica. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003176142(A) 申请公布日期 2003.06.24
申请号 JP20010376641 申请日期 2001.12.11
申请人 SHIN ETSU CHEM CO LTD 发明人 OTSUKA HISATOSHI;SHIROTA KAZUO
分类号 G02B1/02;C03B8/04;C03B19/14;C03B20/00;C03C3/06;C03C4/00;(IPC1-7):C03B20/00 主分类号 G02B1/02
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